Advertisement

Novel approach to recurrent implantation failure: short-term copper intrauterine device placement

      Repeated implantation failure (RIF) remains one of the most enigmatic areas of assisted reproductive technology and while there have been many efforts to investigate etiology and treatment, we presently have no definitive solution. Given that RIF is associated with high emotional and physical tolls that lead to drop out of care, novel treatments are urgently needed.
      To read this article in full you will need to make a payment

      References

        • Fox C.
        • Morin S.
        • Jeong J.W.
        • Scott Jr., R.T.
        • Lessey B.A.
        Local and systemic factors and implantation: what is the evidence?.
        Fertil Steril. 2016; 105: 873-884
        • Coughlan C.
        • Ledger W.
        • Wang Q.
        • Liu F.
        • Demirol A.
        • Gurgan T.
        • et al.
        Recurrent implantation failure: definition and management.
        Reprod Biomed Online. 2014; 28: 14-38
        • Panagiotopoulou N.
        • Karavolos S.
        • Choudhary M.
        Endometrial injury prior to assisted reproductive techniques for recurrent implantation failure: a systematic literature review.
        Eur J Obstet Gynecol Reprod Biol. 2015; 193: 27-33
        • El-Toukhy T.
        • Campo R.
        • Khalaf Y.
        • Tabanelli C.
        • Gianaroli L.
        • Gordts S.S.
        • et al.
        Hysteroscopy in recurrent in-vitro fertilisation failure (TROPHY): a multicentre, randomised controlled trial.
        Lancet. 2016; 387: 2614-2621
        • Mao X.
        • Zhang J.
        • Chen Q.
        • Kuang Y.
        • Zhang S.
        Short-term copper intrauterine device placement improves the implantation and pregnancy rates in women with repeated implantation failure.
        Fertil Steril. 2017; 118: 55-61

      Linked Article